Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Journal of Inorganic Materials
سال: 2019
ISSN: 1000-324X
DOI: 10.15541/jim20180473